Az photoresist data sheet. AZ® 40XT-11D Photoresist, FT=40 μm 40

33μm Primer: HMDS vapor Soft Bake: 90°C, 60s contact hot plate Exposure: Suss MA 56 Aligner … AZ 3300 Photoresists are medium resolution (0. AZ® 40XT-11D Photoresist, FT=40 μm 40. The information given is designed only as a … AZ 5214E-IR is an image reversal photoresist that may be processed in either positive or negative tone. pdf), Text File (. The access data for the data sheets are … ANTI-REFLECTIVE COATINGS Top Anti-Reflective Coatings (TARCs) such as AZ AquatarTM Coating will improve photospeed and with-in die CD uniformity of printed features. AZ 5214E Photoresist Datasheet - Free download as PDF File (. Refer to the current version of the MSDS and to local regulations for up to date information on safe han-dling and proper disposal. , 23 C Plating … The information contained herein is, as far as we are aware, true and accurate. Datasheet for AZ® 50XT photoresist, a positive novolak resist for advanced packaging, TFRH, and MEMS. This resist is very fast for maximum process throughput in positive tone and exhibits superior … Data for AZ 1518 Photoresist 917MIF Further information (US) : No toxicological testing was carried out on the preparation. Ideal lift-off profiles are achieved with a simple bake, expose, PEB and … Unlike thin photoresist processing where the liquid material can simply be spun to equilibrium using a spin curve as a speed reference, achieving target thickness and coating uniformity … Recommended use of the chemical and restrictions on use Recommended use : Intermediate for electronic industry AZ® ECI 3012 is a DNQ based thin positive resist with very high resolution potential for wet and dry etching applications. SECTION 16. 3 Details of the supplier of the safety data sheet Company : AZ Electronic Materials (Germany) GmbH Rheingaustrasse 190-196 , 65203 Wiesbaden Germany Telephone E-mail address : … 1. SUSS Delta AltaSpray) where it provides defect free and … AZ IPS-6000 is an advanced chemically amplified positive tone photoresist optimized for use in high aspect ratio plating, MEMs, and extreme RIE etch applications. AZ® 1518 belongs to the AZ® 1500 photoresist series of positive thin resists (g-, h- and i-line sensitive) with optimized adhesion to all common … AZ 15nXT Series Photoresists are cross linking negative tone materials optimized for use in plating, TSV, RIE etch and high energy implant applications. Three viscosities are … AZ® 9200 thick film photoresist is designed for the more demanding higher-resolution thick resist require-ments. You will receive the access data after … Product identifier Product name Product number : AZ 1512 Photoresist : 583515 Recommended use of the chemical and restrictions on use Details of the supplier of the safety data sheet … APPLICATIONS Thick photopolymer photoresists featuring aspect ratios and photospeed not possible with conventional DNQ type materials, plus etch resistance, chemical resistance, and … AZ 10XT系列应用于电镀工艺的超厚膜,高分辨率I线正型光刻胶Ultra Thick Film High Resolution i-line Standard Positive-tone Photoresist for Plating Process 15 AZ PLP系列应用于高精度电镀 … AZ 100 Remover is especially designed for stripping positive working photoresists like the AZ Photoresists. … AZ ECI 3012 Thermal Oxide AZ ECI 3012 Photoresist Post Oxide Etch Resist Thickness: 1. AZ MiR 703 Photoresist Performance Summary AZ MiR 703 Photoresist : Fastest, cost effective >0. AZ 5214 E is a special photoresist designed for lift-off techniques, primarily used in … Spin on thick AZ4620 photoresist coatings on substrate by a one-step spin process at 2000 rpm for 40 seconds with an acceleration of 425 rpm/s to achieve approximately a thickness of 12 … AZ nLOF® 2070 Photoresist SECTION 1: Identification of the substance/mixture and of the company/undertaking AZ Photoresist Process Guideline Dehydrate wafer at 200 °C for at least 10 minutes (if possible) This recommendation applies only to the product stated in the safety data sheet, supplied by us and for the designated use. AZ nLoF 2000 Series photoresists are negative tone materials designed for single layer lift-off and RIE etch processing. Our safety data sheets are password-protected. A Zfi5 2 0 0 i-Line Photoresist D A T A S H E E T Solvent Safety AZ 5200 photoresist is formulated with propylene glycol monomethyl ether acetate (PGMEA) safer solvent, which is … AZ 12XT-20PL Series Photoresists are advanced chemically amplified i-line resists optimized for plating, TSV, and RIE etch applications. However, no representations or warranties, either express or … AZ® 9200 thick film photoresist is designed for the more demanding higher-resolution thick resist require-ments. Under the guidance of leading thin film recording head manufacturers, AZ® 9200 photoresist is optimized for both coil plating and top pole recor-ding head applications. Compatible materials of construction include glass, quartz, PTFE, PFA, stainless … AZ P4620 Photoresist is a general purpose i-line/h-line/g-line sensitive material engineered for performance in most electro-plating and other metal deposition process environments.

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